1. EUV Lithography;Bakshi,2009
2. Journal of Photopolymer Science and Technology;Brainard,2001
3. Ekinci,Y. Vockenhuber M., Hojeij M., Wang L. and Mojarad N., Extreme Ultraviolet Lithography IV, Proceedings from SPIE, 2013, 8679, 867910.
4. Trikeriotis M., Krysak M., Chung Y., Ouyang C., Cardineau B., Brainard R. L., Ober C., Giannelis E. and Cho K., Proceedings from SPIE, 2012, 8322.
5. M. Trikeriotis, W. Bae, E. Schwartz, M. Krysak, N. Lafferty, P. Xie, B. Smith, P. Zimmerman, C. Ober and E. Giannelis, Proceedings from SPIE, 2010, 7639, 76390E–76390E-76310.