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2. A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography;Ke,2010
3. The coming of age of tilt CD-SEM;Bunday,2007
4. Verification and extension of the MBL technique for photo resist pattern shape measurement;Isawa,2011
5. Impact of Long-Period Line-Edge Roughness (LER) on Accuracy in Critical Dimension (CD) Measurement and New Guideline for CD Metrology