Full-field exposure tools for immersion lithography-Reference-Cited by-同舟云学术

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Full-field exposure tools for immersion lithography

Published:2005-05-12 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XVIII
language:
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Author:

Owa Soichi,Nagasaka Hiroyuki,Ishii Yuuki,Shiraishi Kenichi,Hirukawa Shigeru

Publisher

SPIE

Cited by 33 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fast wafer focus measurement system for photolithography using on-axis structure illumination method;Optics and Lasers in Engineering;2023-03

2. Advances in Patterning Materials for 193 nm Immersion Lithography;Chemical Reviews;2010-01-13

3. Topcoat-free ArF negative tone resist;Advances in Resist Materials and Processing Technology XXVI;2009-03-13

4. Immersion lithography: its history, current status and future prospects;SPIE Proceedings;2008-11-20

5. Formation mechanism of 193nm immersion defects and defect reduction strategies;Advances in Resist Materials and Processing Technology XXV;2008-03-14

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