Fast wafer focus measurement system for photolithography using on-axis structure illumination method-Reference-Cited by-同舟云学术

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Fast wafer focus measurement system for photolithography using on-axis structure illumination method

Published:2023-03 Issue: Volume:162 Page:107412
ISSN:0143-8166
Container-title:Optics and Lasers in Engineering
language:en
Short-container-title:Optics and Lasers in Engineering

Author:

Liu Jianghui^ORCID,Li Qiang^ORCID,Liu Junbo,Hu Song,Qi Chunchao

Funder

National Key Research and Development Program of China

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond;van Schoot;J Micro-Nanolithogr Mems Moems,2017

2. Advantage and feasibility of immersion lithography;Owa;J Microlithogr Microfabr Microsyst,2004

3. DUV or EUV, that is the question;Williamson,2000

4. Full-field exposure tools for immersion lithography;Owa,2005

5. Lithography Focus/Exposure Control and Corrections to Improve CDU, 27th Conference on Metrology, Inspection, and Process Control for Microlithography, San Jose, CA;Kim,2013

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