High resolution defect inspection of step and flash imprint lithography for 32 nm half-pitch patterning-Reference-Cited by-同舟云学术

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High resolution defect inspection of step and flash imprint lithography for 32 nm half-pitch patterning

Published:2008-03-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

McMackin I.,Perez J.,Selinidis K.,Maltabes J.,Resnick D.,Sreenivassan S. V.

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spot scanning imaging calibration method based on deviation model for wafer inspection;Physica Scripta;2024-04-30

2. Optical wafer defect inspection at the 10 nm technology node and beyond;International Journal of Extreme Manufacturing;2022-04-21

3. NanoImprint Lithography;Nano-Lithography;2013-03-07

4. Status of UV Imprint Lithography for Nanoscale Manufacturing;Comprehensive Nanoscience and Technology;2011

5. Silicon-Containing Spin-on Underlayer Material for Step and Flash Nanoimprint Lithography;Japanese Journal of Applied Physics;2010-07-20

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