Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources-Reference-Cited by-同舟云学术

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Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources

Published:2013-07-08 Issue:3 Volume:12 Page:033002
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Danylyuk Serhiy,Loosen Peter,Bergmann Klaus,Kim Hyun-su,Juschkin Larissa

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 35 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of an ultra-compact inline transmission grating spectrograph for extreme ultraviolet wavelengths;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

2. Design of an efficient illuminator for partially coherent sources in the extreme ultraviolet;Applied Optics;2022-04-04

3. Design and realization of an in-lab EUV dual beamline for industrial and scientific applications;International Conference on Extreme Ultraviolet Lithography 2021;2021-10-13

4. Design and realization of an industrial stand-alone EUV resist qualification setup;Extreme Ultraviolet Lithography 2020;2020-10-13

5. Computational proximity lithography with extreme ultraviolet radiation;Optics Express;2020-08-28

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