Lithographic process window optimization for mask aligner proximity lithography-Reference-Cited by-同舟云学术

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Lithographic process window optimization for mask aligner proximity lithography

Published:2014-03-31 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Voelkel Reinhard,Vogler Uwe,Bramati Arianna,Erdmann Andreas,Ünal Nezih,Hofmann Ulrich,Hennemeyer Marc,Zoberbier Ralph,Nguyen David,Brugger Juergen

Publisher

SPIE

Reference16 articles.

1. AZ Electronic Materials, http://www.microchemicals.com/products/photoresists/az_1512hs.html

2. Rapid optimization of the lithographic process window;Ausschnitt,1989

3. Fundamental Principles of Optical Lithography

4. OPC to improve lithographic process window;Word,2006

5. Dr. LiTHO Software, Fraunhofer IISB Erlangen, www.drlitho.com.

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanomaterial integration in micro LED technology: Enhancing efficiency and applications;Next Nanotechnology;2024

2. Advanced Mask Aligner Lithography (AMALITH);SPIE Proceedings;2015-03-18

3. Micro-optics and lithography simulation are key enabling technologies for shadow printing lithography in mask aligners;Advanced Optical Technologies;2015-01-01

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