Will stochastics be the ultimate limiter for nanopatterning?-Reference-Cited by-同舟云学术

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Will stochastics be the ultimate limiter for nanopatterning?

Published:2019-03-26 Issue: Volume: Page:
ISSN:
Container-title:Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
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Author:

Mack Chris A.

Publisher

SPIE

Reference6 articles.

1. Cramming More Components onto Integrated Circuits;Moore;Electronics,1965

2. Limits of Conventional Lithography;Tennant,1999

3. Why optical lithography will live forever

4. Resist blur and line edge roughness;Gallatin;Optical Microlithography XVIII, SPIE,2005

5. Reducing roughness in extreme ultraviolet lithography

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1. Laser Machining at High ∼PW/cm2 Intensity and High Throughput;Photonics;2024-06-26

2. Analysis method to define photoresist resolution in EUV lithography;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

3. Throughput limits for ultra-low voltage electron-beam lithography;Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology;2023-09-29

4. Unmasking the Resolution–Throughput Tradespace of Focused‐Ion‐Beam Machining;Advanced Functional Materials;2022-08-21

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