Ultrashort pulse laser repair of photomasks for advanced lithography technologies-Reference-Cited by-同舟云学术

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Ultrashort pulse laser repair of photomasks for advanced lithography technologies

Published:2018-10-03 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology 2018
language:
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Author:

Robinson Tod E.,LeClaire Jeff

Publisher

SPIE

Reference6 articles.

1. Implementation and performance of a femtosecond laser mask repair system in manufacturing

2. MARS2: An Advanced Femtosecond Laser Mask Repair Tool

3. Productivity of femtosecond DUV laser photomask repair in a real world mask house

4. Advanced laser mask repair in the current wafer foundry environment

5. Update on the performance of photomask repair and clean with DUV femtosecond laser processes

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effects of mask pattern transmission on ArF lithographic performance in contact hole patterning;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-03-22

2. Advanced laser repair of EUV photomasks;Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology;2019-06-27

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