Accuracy in optical overlay metrology
Author:
Affiliation:
1. KLA-Tencor Israel (Israel)
2. KLA-Tencor China (China)
3. KLA-Tencor Taiwan (Taiwan)
Publisher
SPIE
Reference22 articles.
1. Diffraction order control in overlay metrology: a review of the roadmap options
2. A comprehensive look at a new metrology technique to support the needs of lithography performance in near future
3. Evaluation of a novel ultra small target technology supporting on-product overlay measurements.;Smilde,2012
4. Differential signal scatterometry overlay metrology: an accuracy investigation;Kandel,2007
5. Diffraction based overlay metrology: accuracy and performance on front end stack
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