Recent progress in nanoparticle photoresists development for EUV lithography-Reference-Cited by-同舟云学术

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Recent progress in nanoparticle photoresists development for EUV lithography

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
language:
Short-container-title:

Author:

Kasahara Kazuki¹,Kosma Vasiliki¹,Odent Jeremy¹,Xu Hong¹,Yu Mufei¹,Giannelis Emmanuel P.¹,Ober Christopher K.¹

Affiliation:

1. Cornell Univ. (United States)

Publisher

SPIE

Reference7 articles.

1. ITRS website, http://www.itrs.net

2. Novel EUV Resist Development for Sub-14 nm Half Pitch;Hori,2015

3. Recent EUV Resists toward High Volume Manufacturing

4. Development of an inorganic photoresist for DUV, EUV, and electron beam imaging;Trikeriotis,2010

5. Development of an inorganic Nanoparticle Photoresist for EUV, E-beam and 193nm Lithography;Krysak,2011

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1. Layer-Ordered Organooxotin Clusters for Extreme-Ultraviolet Photolithography;ACS Applied Materials & Interfaces;2024-07-22

2. Recent Advances in Positive Photoresists: Mechanisms and Fabrication;Materials;2024-05-25

3. Recent developments in photoresists for extreme-ultraviolet lithography;Polymer;2023-07

4. Ultrasensitive metal-organic cluster resist for patterning of single exposure high numerical aperture extreme ultraviolet lithography applications;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-12-27

5. Laboratory-based reflectometer using line spectra of an RF-induced gas-discharge lamp in 30- to 200-nm wavelength range;Journal of Astronomical Telescopes, Instruments, and Systems;2022-02-10

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