Optical lithography in the sub-50-nm regime-Reference-Cited by-同舟云学术

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Optical lithography in the sub-50-nm regime

Published:2004-05-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Flagello Donis G.,Arnold Bill,Hansen Steve,Dusa Mircea,Socha Robert J.,Mulkens Jan,Garreis Reiner

Publisher

SPIE

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Exploring EUV scanner design options enabled by free electron laser sources;Optical and EUV Nanolithography XXXVII;2024-04-10

2. Photonic properties of hybrid colloidal crystals fabricated by a rapid dip-coating process;Physical Chemistry Chemical Physics;2011

3. Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11

4. Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11

5. Highly reliable detection and correction of pinched areas for high transmission phase shift mask;Optical Microlithography XXI;2008-03-14

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