1. EUV light source for high-NA and low-NA lithography;Umstadter,2023
2. Considerations for a free-electron laser-based extreme-ultraviolet lithography program;Hosler,2015
3. High power light source for future extreme ultraviolet lithography based on energy-recovery linac free-electron laser
4. Optical lithography in the sub-50-nm regime;Flagello,2004
5. Polarization effects in immersion lithography;Adam,2004