Author:
Philipsen Vicky,Hendrickx Eric,Verduijn Erik,Raghunathan Sudhar,Wood Obert,Soltwisch Victor,Scholze Frank,Davydova Natalia,Mangat Pawitter
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24 articles.
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1. Hyper NA EUV lithography: an imaging perspective;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-14
2. Study of novel EUVL mask absorber candidates;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-05-03
3. Mask absorber for next generation EUV lithography;Extreme Ultraviolet Lithography 2020;2020-10-20
4. Perspectives and tradeoffs of absorber materials for high NA EUV lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-10-01
5. Impact of flare on source mask optimization in EUVL for 7nm technology node;Extreme Ultraviolet (EUV) Lithography XI;2020-03-23