Author:
Wu Meiyi,Thakare Devesh,de Marneffe Jean-François,Jaenen Patrick,Souriau Laurent,Opsomer Karl,Soulié Jean-Philippe,Erdmann Andreas,Mesilhy Hazem,Naujok Philipp,Foltin Markus,Soltwisch Victor,Saadeh Qais,Philipsen Vicky
Cited by
5 articles.
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1. Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-06-21
2. Evaluation of Ta-Co alloys as novel high-k EUV mask absorber;Optical and EUV Nanolithography XXXV;2022-05-26
3. Resist line edge roughness mitigation at high-NA EUVL;Advances in Patterning Materials and Processes XXXIX;2022-05-25
4. First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials;International Conference on Extreme Ultraviolet Lithography 2021;2021-10-12
5. Study of novel EUVL mask absorber candidates;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-05-03