Technological innovations for a sustainable business model in the semiconductor industry-Reference-Cited by-同舟云学术

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Technological innovations for a sustainable business model in the semiconductor industry

Published:2014-09-05 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Photonic Innovations and Solutions for Complex Environments and Systems (PISCES) II
language:
Short-container-title:

Author:

Levinson Harry J.

Publisher

SPIE

Reference18 articles.

1. Principles of Lithography;Levinson,2010

2. Overview of Lithography: Challenges and Metrologies;Levinson,2003

3. Remaining Issues for EUV Lithography in High Volume Manufacturing;Levinson,2014

4. Split and design guidelines for double patterning;Wiaux,2008

5. ITRS Lithography Table, http://www.itrs.net/Links/2013ITRS/Home2013.htm.

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lithography in a quantum world;Japanese Journal of Applied Physics;2023-02-17

2. High-NA EUV lithography: current status and outlook for the future;Japanese Journal of Applied Physics;2022-04-20

3. Illumination uniformity correction by using dynamic gray filters in a lithography system;Applied Optics;2022-03-25

4. High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-10-30

5. Programmable uniformity correction by using plug-in finger arrays in advanced lithography system;Optics Communications;2017-06

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