Study of angular effects for optical systems into the EUV
Author:
Affiliation:
1. Rochester Institute of Technology (United States)
Publisher
SPIE
Reference18 articles.
1. Driving the industry to a consensus on high-NA EUV;Keamey,2014
2. Shadowing effect modeling and compensation for EUV lithography
3. Mask effects for high-NA EUV: impact of NA, chief-ray-angle, and reduction ratio
4. O. Chun, Y. Li, L. Liu; “Reduction of image optics dependence of resist image performance for high NA extreme ultraviolet lithography” Proc. SPIE 9042, 2013 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 90421J (2013).
5. Incident angle change caused by different off-axis illumination in extreme ultraviolet lithography
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1. Design method for an off-axis reflective anamorphic optical system with aberration balance and constraint control;Applied Optics;2021-05-21
2. Lithographic pattern formation in the presence of aberrations in anamorphic optical systems;Extreme Ultraviolet (EUV) Lithography XI;2020-03-23
3. Image-based pupil plane characterization for anamorphic lithography systems;SPIE Proceedings;2017-03-24
4. Optimization of Phase-Shifting Absorber Stack for High-NA EUV Lithography;Korean Journal of Metals and Materials;2016-06-05
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