Sub-20nm hybrid lithography using optical, pitch-division, and e-beam-Reference-Cited by-同舟云学术

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Sub-20nm hybrid lithography using optical, pitch-division, and e-beam

Published:2012-03-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies IV
language:
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Author:

Belledent J.,Smayling M.,Pradelles J.,Pimenta-Barros P.,Barnola S.,Mage L.,Icard B.,Lapeyre C.,Soulan S.,Pain L.

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A novel SEM image based advanced lithography process control providing quick feedback;2020 International Workshop on Advanced Patterning Solutions (IWAPS);2020-11-05

2. An advanced and efficient methodology for process setup and monitoring by using process stability diagnosis in computational lithography;Design-Process-Technology Co-optimization for Manufacturability XIV;2020-03-23

3. Chemically amplified molecular resists based on noria derivatives containing adamantyl ester groups for electron beam lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-07

4. Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography;Microelectronic Engineering;2016-04

5. mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning;SPIE Proceedings;2016-03-21

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