Full-chip GPU-accelerated curvilinear EUV dose and shape correction-Reference-Cited by-同舟云学术

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Full-chip GPU-accelerated curvilinear EUV dose and shape correction

Published:2017-10-31 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology
language:
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Author:

Fujimura Aki,Syrel Oleg,Bouaricha Ali,Niewczas Mariusz,Su Bo,Pang Linyong,Zable Harold R.,Pearman Ryan,Shendre Abhishek

Publisher

SPIE

Reference7 articles.

1. MBMW-101: World’s 1st high-throughput multi-beam mask writer;Klein,2016

2. Multi-Beam Mask Writer MBM-1000 and its Application Field;Matsumoto,2016

3. Challenges and technical requirements for multi-beam mask writer development;Lee,2014

4. Improving CD uniformity using MB-MDP for 14nm node and beyond;Kim,2012

5. GPU-Accelerated Inline Mask Correction for the MBM-1000;Zable,2017

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Tackling data inconsistency and runtime issues in inverse lithography technology (ILT) with comparative convergence study;DTCO and Computational Patterning III;2024-04-10

2. You do not need 1 nm contours for curvilinear shapes: pixel-based computing is the answer;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-24

3. You don’t need 1nm contours for curvilinear shapes: pixel-based computing is the answer;Photomask Technology 2022;2022-12-01

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