Chemically amplified molecular resist based on fullerene derivative for nanolithography-Reference-Cited by-同舟云学术

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Chemically amplified molecular resist based on fullerene derivative for nanolithography

Published:2008-03-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Materials and Processing Technology XXV
language:
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Author:

Yamamoto Hiroki,Kozawa Takahiro,Tagawa Seiichi,Ando Tomoyuki,Ohmori Katsumi,Sato Mitsuru,Onodera Junichi

Publisher

SPIE

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Trends in photoresist materials for extreme ultraviolet lithography: A review;Materials Today;2023-07

2. Positive molecular resists;Materials and Processes for Next Generation Lithography;2016

3. Overview of materials and processes for lithography;Materials and Processes for Next Generation Lithography;2016

4. Negative-tone organic molecular resists;Materials and Processes for Next Generation Lithography;2016

5. Positive-tone chemically amplified fullerene resist;SPIE Proceedings;2012-03-29

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