System architecture choices for an advanced mask writer (100 to 130 nm)-Reference-Cited by-同舟云学术

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System architecture choices for an advanced mask writer (100 to 130 nm)

Published:1999-12-30 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Chakarian Varoujan,Raymond III Frederick,Sauer Charles A.,Babin Sergey V.,Innes Robert,Sagle Allan L.,Hofmann Ulrich,Shamoun Bassam,Trost David,Ghanbari Abe,Abboud Frank E.

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Next-generation lithography for 22 and 16 nm technology nodes and beyond;Science China Information Sciences;2011-05

2. Spin stream develop process for ZEP resist;SPIE Proceedings;2004-08-20

3. Predictive and corrective model for bulk heating distortion in photomasks;SPIE Proceedings;2000-07-05

4. Implementation of real-time proximity effect correction in a raster shaped beam tool;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2000

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