EUV source-mask optimization for 7nm node and beyond-Reference-Cited by-同舟云学术

EUV source-mask optimization for 7nm node and beyond

Published:2014-04-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Liu Xiaofeng¹,Howell Rafael¹,Hsu Stephen¹,Yang Kaiyu¹,Gronlund Keith¹,Driessen Frank¹,Liu Hua-Yu¹,Hansen Steven²,van Ingen Schenau Koen³,Hollink Thijs³,van Adrichem Paul³,Troost Kars³,Zimmermann Jörg⁴,Schumann Oliver⁴,Hennerkes Christoph⁴,Gräupner Paul⁴

Affiliation:

1. ASML Brion (United States)

2. ASML Technology Development Ctr. (United States)

3. ASML Netherlands B.V. (Netherlands)

4. Carl Zeiss SMT GmbH (Germany)

Publisher

SPIE

Reference6 articles.

1. An Innovative Source-Mask co-Optimization (SMO) Method for Extending Low k1 Imaging;Hsu,2009

2. Source Mask Optimization Methodology (SMO) & Application to Real Full Chip Optical Proximity Correction;Zhang,2012

3. ASML’s NXE platform performance and volume introduction;Peeters,2013

4. Optics for ASML’s NXE:3300B platform;Lowisch,2013

5. Fast 3D thick mask model for full-chip EUVL simulations;Liu,2013

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