First light and results on EBL2-Reference-Cited by-同舟云学术

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First light and results on EBL2

Published:2017-07-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Koster Norbert¹,te Sligte Edwin¹,Deutz Alex¹,Molkenboer Freek¹,Muilwijk Pim¹,van der Walle Peter¹,Mulckhuyse Wouter¹,Nijland Bjorn¹,Kerkhof Peter¹,van Putten Michel¹

Affiliation:

1. TNO (Netherlands)

Publisher

SPIE

Reference6 articles.

1. EUV progress toward HVM readiness;Turkot,2016

2. Strategy for Minimizing EUV Optics;Harned,2008

3. A New Mask Exposure and Analysis Facility;Sligte;Photomask Technology 2014,2014

4. EBL2, a flexible, controlled EUV exposure and surface analysis facility;Sligte;Photomask Japan,2016

5. EBL2: high power EUV exposure facility;Sligte;Photomask Technology,2016

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low-Energy Plasma Source for Clean Vacuum Environments: EUV Lithography and Optical Mirrors Cleaning;IEEE Transactions on Plasma Science;2021-10

2. Characterization of EBL2 EUV exposure facility;International Conference on Extreme Ultraviolet Lithography 2017;2017-10-16

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