Scatterometry modeling for gratings with roughness and irregularities
Author:
Affiliation:
1. Osires Optical Engineering (Germany)
2. Optimod (Germany)
Publisher
SPIE
Reference17 articles.
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5. Effective medium approximations for modeling optical reflectance from gratings with rough edges
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1. Diffuse scattering due to stochastic disturbances of 1D-gratings on the example of line edge roughness;Optics Express;2018-10-12
2. Diffuse scattering of lamellar optical gratings due to line edge roughness;Optical Fabrication, Testing, and Metrology VI;2018-06-15
3. Advanced EUV mask and imaging modeling;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-08-19
4. Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-05-17
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