Author:
Moon Seongho,Yang Seunghune,Shamsuarov Artem,Kim Eunju,Ser Junghoon,Kim Youngchang,Choi Seongwoon,Kang Changjin,Klostermann Ulrich,Küchler Bernd,Lewellen John,Schmöller Thomas,Lee Sooryong
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11