Characteristics performance of production-worthy multiple e-beam maskless lithography-Reference-Cited by-同舟云学术

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Characteristics performance of production-worthy multiple e-beam maskless lithography

Published:2010-03-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Lin S. J.,Wang W. C.,Chen P. S.,Liu C. Y.,Lo T. N.,Chen Jack J. H.,Krecinic Faruk,Lin Burn J.

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Cost-effective and channel-scalable hardware decoders for multiple electron-beam direct-write systems;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-22

2. Development of maskless electron-beam lithography using nc-Si electron-emitter array;Alternative Lithographic Technologies V;2013-03-26

3. Future of multiple-e-beam direct-write systems;Journal of Micro/Nanolithography, MEMS, and MOEMS;2012-09-28

4. Factors that determine the optimum dose for sub-20nm resist systems: DUV, EUV, and e-beam options;SPIE Proceedings;2012-03-29

5. Future of multiple-e-beam direct-write systems;Alternative Lithographic Technologies IV;2012-03-01

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