Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond

Author:

Pfeiffer Dirk,Mahorowala Arpan P.,Babich Katherina,Medeiros David R.,Petrillo Karen E.,Angelopoulos Marie,Huang Wu-Song,Halle Scott,Brodsky Colin,Allen Scott D.,Holmes Steven J.,Kwong Ranee W.,Lang Robert,Brock Phillip J.

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Thermally induced wrinkling in thin-film stacks on patterned substrates;IBM Journal of Research and Development;2009-05

2. Reworkable spin-on trilayer materials: optimization of rework process and solutions for manufacturability;Advances in Resist Materials and Processing Technology XXVI;2009-03-13

3. Spin-on trilayer scheme: enabling materials for extension of ArF immersion lithography to 32nm node and beyond;SPIE Proceedings;2008-11-20

4. Holographic lithography for grating coupler fabrication in gallium nitride grown on sapphire substrate;Proceedings of 2005 International Students and Young Scientists Workshop Photonics and Microsystems, 2005.

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