ArF step-and-scan system with 0.75 NA for the 0.10μm node

Author:

Vleeming Bert,Heskamp Barbra,Bakker Hans,Verstappen Leon,Finders Jo,Stoeten Jan,Boerret Rainer,Roempp Oliver

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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4. Focusing and leveling in dual stage lithographic system;5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems;2010-05-13

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