High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements

Published:2013-04-12 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Mulkens Jan,Kubis Michael,Hinnen Paul,de Graaf Roelof,van der Laan Hans,Padiy Alexander,Menchtchikov Boris

Publisher

SPIE

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Direct correlation between mask registration and on-wafer measurements for individual logic device features;Photomask Technology 2022;2022-12-01

2. The mask contribution as part of the intra-field on-product overlay performance;Photomask Technology 2020;2020-10-12

3. On-product focus monitoring and control for immersion lithography in 3D-NAND manufacturing;Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-20

4. Hybrid Overlay Modeling for Field-by-Field Error Correction in the Photolithography Process;IEEE Transactions on Semiconductor Manufacturing;2020-02

5. The impact of the reticle and wafer alignment mark placement accuracy on the intra-field mask-to-mask overlay;Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology;2019-06-27

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP