The need for EUV lithography at advanced technology for sustainable wafer cost-Reference-Cited by-同舟云学术

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The need for EUV lithography at advanced technology for sustainable wafer cost

Published:2013-04-08 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography IV
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Author:

Mallik Arindam,Vansumere Wim,Ryckaert Julien,Mercha Abdelkarim,Horiguchi Naoto,Demuynck Steven,Bömmels Jürgen,Zsolt Tokei,Vandenberghe Geert,Ronse Kurt,Thean Aaron,Verkest Diederik,Lebon Hans,Steegen An

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective;Nanomaterials;2021-04-22

2. Real-time plasma monitoring technique using incident-angle-dependent optical emission spectroscopy for computer-integrated manufacturing;Robotics and Computer-Integrated Manufacturing;2018-08

3. Isotopic Labeling Studies of EUV Photoresists Containing Antimony;Journal of Photopolymer Science and Technology;2018-06-25

4. Impact of design-parameters on the optical performance of a high-power adaptive mirror;High-Power Laser Materials Processing: Applications, Diagnostics, and Systems VI;2017-02-22

5. Quantifying imaging performance bounds of extreme dipole illumination in high NA optical lithography;SPIE Proceedings;2016-10-03

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