Novel high-contrast phase-shifting masks for EUV interference lithography-Reference-Cited by-同舟云学术

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Novel high-contrast phase-shifting masks for EUV interference lithography

Published:2020-03-23 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography XI
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Author:

Lüttgenau Bernhard,Brose Sascha,Danylyuk Serhiy,Stollenwerk Jochen,Loosen Peter

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Towards the resolution limit of Talbot lithography with compact EUV exposure tools;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01

2. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-11

3. Design of an efficient illuminator for partially coherent sources in the extreme ultraviolet;Applied Optics;2022-04-04

4. Design and realization of an in-lab EUV dual beamline for industrial and scientific applications;International Conference on Extreme Ultraviolet Lithography 2021;2021-10-13

5. Design and realization of an industrial stand-alone EUV resist qualification setup;Extreme Ultraviolet Lithography 2020;2020-10-13

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