How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive-Reference-Cited by-同舟云学术

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How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive

Published:2020-03-23 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography XI
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Author:

Anderson Christopher Neil,Allezy Arnaud,Chao Weilun,Conley Lucas,Cork Carl,Cork Will,Delano Rene,DePonte Jason,Dickinson Michael,Gaines Geoff,Gamsby Jeff,Gullikson Eric,Jones Gideon,McQuade Lauren,Miyakawa Ryan,Naulleau Patrick,Rekawa Senajith,Salmassi Farhad,Vollmer Brandon,Zehm Daniel,Zhu Wenhua

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stochastic defect generation depending on tetraalkylhydroxide aqueous developers in extreme ultraviolet lithography;Japanese Journal of Applied Physics;2023-01-01

2. Mechanistic Advantages of Organotin Molecular EUV Photoresists;ACS Applied Materials & Interfaces;2022-01-25

3. Application of ethyltrimethylammonium hydroxide (ETMAH) as an alternative developer solution/process for semiconductor lithography;Japanese Journal of Applied Physics;2021-02-22

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