1. “International Technology Roadmap for Semiconductors,” Metrology Section, table MET3, 2013, public.itrs.net
2. Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library
3. NIST-Traceable Calibration of CD-SEM Magnification Using a 100nm Pitch Standard;Tortonese,2003
4. 100 nm pitch standard characterization for metrology applications;Tortonese,2002
5. 25 nm pitch comparison between a traceable x-ray diffractometer and a metrological atomic force microscope