Asymmetric line edge roughness of multilayer grating reference materials-Reference-Cited by-同舟云学术

Asymmetric line edge roughness of multilayer grating reference materials

Published:2018-03 Issue:3 Volume:8 Page:035311
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Wang Xingrui¹,Cheng Xinbin¹,Zhang Longfei¹,Deng Xiao²,Li Tongbao¹

Affiliation:

1. Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai, China, 200092 and MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai, China, 200092

2. School of Aerospace Engineering and Applied Mechanics, Tongji University, Shanghai, China, 200092

Funder

Major projects of Science and Technology Commission of Shanghai

National Key Scientific Instrument and Equipment Development Project

National Program on Key Research Project

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5009513

Reference29 articles.

1. Resistivity of epitaxial copper nanolines with trapezoidal cross-section

2. Development and characterisation of a new line width reference material

3. Line edge roughness impact on critical dimension variation

4. I. Misumi, S. Gonda, O. Sato, K. Sugawara, K. Yoshizaki, Q. Huang, T. Kurosawa, and T. Takatsuji, XVIII IMEKO World Congress Metrology for a Sustainable Development, 17–22 (2006).

5. Application of a GaAs/InGaP superlattice in nanometric lateral scales

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