Mo/Si multilayer mirrors with 300-bilayers for EUV lithography-Reference-Cited by-同舟云学术

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Mo/Si multilayer mirrors with 300-bilayers for EUV lithography

Published:2015-07-09 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
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Author:

Ichimaru Satoshi,Hatayama Masatoshi,Ohchi Tadayuki,Oku Satoshi

Publisher

SPIE

Reference17 articles.

1. Gigaphoton Inc., News, 17 Feb 2015, http://www.gigaphoton.com/news/

2. Optics.org, News, 21 Jan 2015, http://optics.org/news/6/1/28

3. Lifetime and refurbishment of multilayer LPP collector mirrors

4. EUV Sources for Lithography

5. Heat-Resistance of Mo/Si Multilayer EUV Mirrors with Interleaved Carbon Barrier-Layers;Takenaka,1996

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1. 基于百太瓦级激光系统驱动的高能量13 nm波段高次谐波产生;Acta Optica Sinica;2024

2. An in situ method using a Y-type optical fiber for measuring the thickness of the carbon contamination layer on the surface of an extreme ultraviolet mirror;Review of Scientific Instruments;2020-11-01

3. An analysis of the impact of native oxide, surface contamination and material density on total electron yield in the absence of surface charging effects;Applied Surface Science;2016-10

4. Identification of multilayer structures using secondary electron yield curves: effect of native oxide films on EUV-patterned mask inspection;SPIE Proceedings;2016-03-24

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