Benefits and prospects of aqueous silylation for novel dry developable high-resolution resists-Reference-Cited by-同舟云学术

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Benefits and prospects of aqueous silylation for novel dry developable high-resolution resists

Published:1990-06-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Sezi Recai¹,Sebald Michael¹,Leuschner Rainer¹,Ahne Hellmut¹,Birkle Siegfried¹,Borndoerfer Horst¹

Affiliation:

1. Siemens AG (Germany)

Publisher

SPIE

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photolithography;Materials Science and Technology;2013-02-15

2. A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep-Ultraviolet Lithography: I. Limited Permeation of Si Compounds from Vapor Phase*;Japanese Journal of Applied Physics;2000-02-15

3. POLYMER MATERIALS FOR MICROELECTRONICS IMAGING APPLICATIONS;Applied Polymer Science: 21st Century;2000

4. Microlithographic Applications of Organosilicon Polymers;Silicon-Containing Polymers;2000

5. Liquid phase silylation of a bilayer resist system;Microelectronic Engineering;1999-08

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