Method of stress and measurement modes for research of thin dielectric films of MIS structures
Author:
Affiliation:
1. Bauman Moscow State Technical Univ. (Russian Federation)
2. Zelenograd Research Institute of Physical Problems (Russian Federation)
Publisher
SPIE
Reference14 articles.
1. JEDEC Standard, “JESD35A: Procedure for the WaferLevel Testing of Thin Dielectrics.” (2001).
2. Reliability Wearout Mechanisms in Advanced CMOS Technologies
3. Multilevel current stress technique for investigation thin oxide layers of mos structures;Andreev,2012
4. Surface and Interface Analysis
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