Author:
Kovalevich Tatiana,Witek Barbara,Riggs Daniel,Bekaert Joost,Van Look Lieve,Maslow Mark John
Reference2 articles.
1. Overlay and edge placement control strategies for the 7nm node using euv and arf lithography;Mulkens;[Extreme Ultraviolet (EUV) Lithography VI],2015
2. Optimization and stability of cd variability in pitch 40 nm contact holes on nxe: 3300;Van Look,2018