1. Improving lithographic performance for 32 nm;Busch,2010
2. Lithographic scanner stability improvements through advanced metrology and control;Vanoppen,2010
3. On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections;Bhattacharyya,2013
4. Litho process control via optimum metrology sampling while providing cycle time reduction and faster metrology-to-litho turn around time;Chen,2011
5. High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements;Mulkens,2013