CD uniformity improvement of dense contact array in negative tone development process-Reference-Cited by-同舟云学术

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CD uniformity improvement of dense contact array in negative tone development process

Published:2015-03-19 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Tsai Fengnien,Yeh Teng-hao,Yang C. C.,Yang Elvis,Yang T. H.,Chen K. C.

Publisher

SPIE

Reference11 articles.

1. The Study for Close Correlation of Mask and Wafer to Optimize Wafer Field CD Uniformity;Kim,2007

2. Integrating Cr and MoSi Etch for Optimal Photomask Critical Dimension Uniformity and Phase Uniformity;Wistrom,2008

3. Impact of Proximity Model Inaccuracy on Patterning in Electron Beam Lithography;Chen,2013

4. Measuring and Modeling Flare in Optical Lithography;Mack,2003

5. Flare and Its Effects on Images;Renwick,2004

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Wafer CD Uniformity Improvement in Negative Tone Development Process;Journal of Photopolymer Science and Technology;2019-06-24

2. Investigation of systematic CD distribution error on intrafield;SPIE Proceedings;2016-03-15

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