1. CD uniformity improvement of dense contact array in negative tone development process;Tsai,2015
2. Investigation and mitigation of field-edge CDU fingerprint for ArFi lithography for 45 nm to sub 28 nm logic nodes;Le-Gratiet,2012
3. The Loading Effect in Plasma Etching
4. Pattern dependent modeling for CMP optimization and control;Boning,1999
5. CD variations correction by local transmission control of photomasks done with a novel laser based process;Zait,2006