1. Error analysis of overlay compensation methodologies and proposed functional tolerances for EUV photomask flatness;Katherine,2016
2. New technique for measuring free-form wafer shape for feed-forward overlay corrections
3. Manish Chandhok, Sanjay Goyal, Steven Carson, Seh-Jin Park, Guojing Zhang, Alan, M. Myers, Michael, L. Leeson, Marilyn Kamna, Fabian, C. Martinez, Alan, R. Stivers, Gian, F. Lorusso, Jan Hermans, Eric Hendrickx, Sanjay Govindjee, Gerd Brandstetter, Tod Laursen, “Compensation of overlay errors due to mask bending and non-flatness for EUV masks,” Proc. SPIE 7271, Alternative Lithographic Technologies, 72710G
4. Evaluation of photomask flatness compensation for extreme ultraviolet lithography;Katherine,2016
5. Wave front phase imaging for silicon wafer metrology;Juan;Proc. SPIE Optics + Photonics 1221605 Novel Optical Systems, Methods, and Applications XXV,2022