Image contrast enhancement of multiple patterning features through lower light source bandwidth
Author:
Affiliation:
1. Cymer LLC (Belgium)
2. Cymer LLC (United States)
3. TEL Tokyo Electron Limited (Belgium)
Publisher
SPIE
Reference19 articles.
1. 2015 International Technology Roadmap for Semiconductors (ITRS); http://www.semiconductors.org/main/2015_international_technology_roadmap_for_semiconductors_itrs/
2. Laser bandwidth effect on overlay budget and imaging for the 45 nm and 32nm technology nodes with immersion lithography
3. Analysis of the effect of laser bandwidth on imaging of memory patterns
4. De Bisschop P et al., “Impact of finite laser bandwidth on the critical dimension of l/s structures.” J. Micro/Nanolith. MEMS MOEMS. 0001; 7(3):033001–033001-16.
5. Impact of bandwidth on contrast sensitive structures for low k1 lithography;Conley,2015
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1. Tunable bandwidth for application-specific SAxP process enhancement;Optical Microlithography XXXI;2018-03-20
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