In-line monitoring of overlay and process window using design-assisted voltage contrast inspection for 14nm FINFET technology-Reference-Cited by-同舟云学术

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In-line monitoring of overlay and process window using design-assisted voltage contrast inspection for 14nm FINFET technology

Published:2022-05-26 Issue: Volume: Page:
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Container-title:Metrology, Inspection, and Process Control XXXVI
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Author:

Li Runling,Hsu I-Kai,Brozek Tomasz,Yang Linrong,He Debiao,Wu Fangrui,Ren Jiadong,Zhu Yefang,Zhang Yan,Liu Pei,Zhang Haiqiong,Zhang Guifeng,Fu Yingying,Yin Shan,Jia Yujie,Yu Bo

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mitigating the Impact of Asymmetric Deformation on Advanced Metrology for Photolithography;Applied Sciences;2024-05-23

2. Accelerating FinFET MOL Process Development Using Design for Inspection Methodology;2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2022-05-02

3. Novel E-beam Techniques for Inspection and Monitoring;2022 6th IEEE Electron Devices Technology & Manufacturing Conference (EDTM);2022-03-06

4. Application of e-Beam Voltage Contrast Technique for Overlay Improvement and Process Window Control in Multi-Patterning Interconnect Scheme;IEEE Journal of the Electron Devices Society;2022

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