The measurement capabilities of cross-sectional profile of Nanoimprint template pattern using small angle x-ray scattering
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SPIE
Reference3 articles.
1. Nanoimprint Lithography, Lithography;Lan,2010
2. Small angle x-ray scattering for measuring pore-size distributions in porous low-κ films
3. A new x-ray metrology for determining cross-sectional profile of semiconductor device pattern
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