1. Performance overview and outlook of EUV lithography systems;Pirati,2015
2. The patterning center of excellence (CoE): an evolving lithographic enablement model;Montgomery,2015
3. Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution;Mcintyre,2013
4. Impact of EUV photomask line edge roughness on wafer prints;Qi,2012
5. Towards reduced impact of EUV mask defectivity on wafer;Jonckheere,2014