Influence of the dose assignment and fracturing type on patterns exposed by a variable shaped e-beam writer: simulation vs experiment
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SPIE
Reference10 articles.
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2. Nanofabrication by electron beam lithography and its applications: A review
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4. Limitations of variable shaped electron beam lithography for advanced research and semiconductor applications
5. Checkerboard pattern for PSF parameter determination in electron beam lithography
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1. Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device;38th European Mask and Lithography Conference (EMLC 2023);2023-10-05
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