Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device-Reference-Cited by-同舟云学术

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Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device

Published:2023-10-05 Issue: Volume: Page:
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Container-title:38th European Mask and Lithography Conference (EMLC 2023)
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Author:

Brackmann Varvara,Neul Malte,Friedrich Michael,Langheinrich Wolfram,Simon Maik,Muster Pascal,Pregl Sebastian,Demmler Arne,Hanisch Norbert,Lederer Maximilian,Zimmermann Katrin,Klos Jan,Reichmann Felix,Yamamoto Yuji,Wislicenus Marcus,Dahl Claus,Schreiber Lars R.,Bluhm Hendrik,Lilienthal-Uhlig Benjamin

Publisher

SPIE

Reference48 articles.

1. Quantum computation with quantum dots

2. Quest for qubits

3. Silicon quantum electronics

4. Surface codes: Towards practical large-scale quantum computation

5. Quantum

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