Study of the linewidth measurement with scanning electron microscope based on laser interference principle-Reference-Cited by-同舟云学术

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Study of the linewidth measurement with scanning electron microscope based on laser interference principle

Published:2019-01-24 Issue: Volume: Page:
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Container-title:9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics
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Author:

Chu Mingzhang,Li Xue,Xu Guanglu,Liu Junbiao,Chen Daixie,Li Han,Yin Bohua,Jiang Chao,Cai Xiaoyong

Publisher

SPIE

Reference12 articles.

1. 450 mm Silicon Wafers Are Imperative for Moore's Law but maybe Postponed

2. A “Moore's Law”-like approach to roadmapping photovoltaic technologies

3. International Technology Roadmap for Semiconductors, 2013 Edition, Metrology Section

4. K.A. Dick etc. Measuring the properties of semiconductor nanowires with transmission electron microscopy.

5. Semiconductor Nanowires, 2015, Pages 203–219

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