Wafer scale fabrication of silicon nitride MEMS phase shifters with XeF2 dry vapor release etch process-Reference-Cited by-同舟云学术

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Wafer scale fabrication of silicon nitride MEMS phase shifters with XeF2 dry vapor release etch process

Published:2022-03-05 Issue: Volume: Page:
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Container-title:Silicon Photonics XVII
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Author:

McNulty Karl,van Niekerk Matthew,Deenadayalan Venkatesh,Errando-Herranz Carlos,Pruessner Marcel,Fanto Michael L.,Preble Stefan F.

Publisher

SPIE

Reference21 articles.

1. Foundry-processed optomechanical photonic integrated circuits;Pruessner;OSA Continuum,2021

2. Broadband opto-electro-mechanical effective refractive index tuning on a chip

3. IEEE Journal of Selected Topics in Quantum Electronics

4. Optoelectromechanical phase shifter with low insertion loss and 13π tuning range;Pernice;Optics Express,2020

5. Dual slot-mode noem phase shifter;Baghdadi;Optics Express,2021

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An Integrated 1 × 5 MEMS Silicon Nitride Photonics Switch;Journal of Lightwave Technology;2024-07-01

2. Coupled Mode Design of Low-Loss Electromechanical Phase Shifters;Micro;2024-05-06

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